Multiple choice

Plasma etching is a form of plasma processing used to fabricate integrated circuits. The nitrogen compound used in the plasma etching of silicon wafers is

  1. nitrogen tribromide

  2. nitrogen trichloride

  3. nitrogen trifluoride

  4. nitrogen triiodide
Reveal answer Fill a bubble to check yourself
C Correct answer
Explanation

Nitrogen trifluoride is an inorganic compound with the formula NF3. This nitrogen-fluorine compound is a colourless, toxic, odourless, nonflammable gas. It is used in the plasma etching of silicon wafers.

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